论文、著作、专利 |
【论文】 1. Gang Li#, Zhuoqing Chang#, Tingyu Li*, Kaiying Wang*, In situ growth of hexagonal prism-like Ni(OH)2 microrods on nickel foam as binder-free electrodes, Ionics, 2019: 1-8. 2. Zhuoqing Chang#, Tingyu Li*, Gang Li, Kaiying Wang*, One-pot in-situ synthesis of Ni(OH)2–NiFe2O4 nanosheet arrays on nickel foam as binder-free electrodes for supercapacitors, Journal of Materials Science: Materials in Electronics, 2019, 30: 600-608. 3. Gang Li#, Lei Sheng, Tingyu Li, Wendong Zhang, Kaiying Wang*, Inhibiting formation of Zn2+/N179 molecules insulation layer and degradation of ZnO-based dye-sensitized solar cells via quasi-solid-state electrolytes, Applied Surface Science, 2019, 488: 455-461. 4. Gang Li#, Zhuoqing Chang, Tingyu Li, Lili Ma, Kaiying Wang*, Hierarchical Mn-Co sulfide nanosheets on nickel foam by electrochemical co-deposition for high-performance pseudocapacitors, Ionics, 2019, 177: 1-11. 5. Gang Li#, Lei Sheng, Tingyu Li, Jie Hu, Pengwei Li, Kaiying Wang*, Engineering flexible dye-sensitized solar cells for portable electronics, Solar Energy, 2019,177: 80-98. 6. Tingyu Li#, Saburo Sakurai, Katusyuki Kasai, Lirong Wang, Masayoshi Watanabe, Yun Zhang*, Experimental observation of three-photon interference between a two-photon state and a weak coherent state on a beam splitter, Optics Express, 2018, 26(16): 20442-20449. 7. Yinghong Xue#, Tingyu Li, Yoshiko Okasa-Shudo, Masayoshi Watanabe, Yun Zhang*, Controlling quantum interference in phase space, Sci. Rep., 2017, 7(1): 2291. 8. 王慧#, 李廷鱼*, 级联式磁耦合谐振系统的效率分析, 电子技术应用, 2016, 42(5), 42-45. 9. Tingyu Li#,Ryohei Mitazaki,Katsuyuki Kasai,Yoshiko Okada-Shudo,Masayoshi Watanabe,Yun Zhang*, Generation of tripartite quantum correlation among amplitude-squeezed beams by frequency doubling in a singly resonant cavity, Phys. Rev. A, 2015, 91(2): 023833. 10. Chai Jing#*, Ding Xinghao, Chen Hongtao, Li Tingyu, Pattern Recognition, 2014, 47(7): 2517-2531. 11. 李廷鱼#*, 张赟, 实现振幅控制量子干涉的实验方案, 量子光学学报, 2014, 20(2): 85-89. 【专利】 1. 李廷鱼#, 李刚, 胡文秀, 赵清华, 王娜, 李鹏伟, 胡杰, 张文栋, 一种加固碳化光刻胶与Si基底结合的凹槽刻蚀方法, 2015.7.10, 中国, ZL 2015 1 0402800.0. |